Thin Film Equipment

Process Technology

Ion Beam Sputtering

  • Illustration

    Ion beam sputtering uses an ion source to sputter target material to deposit thin films onto a substrate. This process allows for depositions to be carried out at better vacuum ranges resulting in films with improved adhesion, dense film structure, less defects, higher purity, and better controlled composition HHV offers ion beam sputtering systems for R&D and production applications.

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