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Atomic Layer Deposition

  • Atomic Layer Deposition | Thin Film Technology

    Atomic layer deposition (ALD) is an advanced vapour phase deposition technique based on the sequential use of precursors and gives 100 percent conformal coverage and excellent thickness uniformity with pinhole free coatings. HHV offers highly cost effective thermal ALD tools with built-in process recipes and a user-friendly software interface.

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