Thin Film Equipment

Products / R&D

RIE Series

Reactive Ion Etching (RIE) uses physical and chemical processes to etch away materials from surface of samples. In RIE, a glow discharge plasma is formed between two electrodes. This creates ions of inert and reactive gases that remove materials from the substrate surface. This process is extensively used for fabrication of high performance nano and micro scale devices.


     Optimized shower head design for uniform gas distribution
    Low cost of ownership  
    Adjustable source to shower head distance
    User friendly interface
    Fluorine and Chlorine based chemistry offered
    Fully interlocked for operator and machine safety