Thin Film Equipment

  • Illustration

    Plasma enhanced chemical vapour deposition (PECVD) processes induce a chemical reaction between coupled electrodes which results in a thin film being deposited on a substrate. HHVAT offers PECVD systems in various configurations such as single, load-lock and multi-chamber cluster tools to suit customer needs.

    Related Products

Features

    Substrate plate to accommodate up to 8” wafers
    Built-in process recipes
    Substrate biasing options of DC, Pulsed DC or RF
    Compact cabinet design offering minimized footprint
    In-situ cleaning
    Dual frequency (RF & LF) power supply for film stress control
    Substrate heating up to 800°C

Resources

We are proud of the cutting-edge R&D our customers are doing using HHVAT PECVD systems and we want to communicate their scientific work. Our customers research has significant contributions towards technological advancements in various applications from optoelectronics, semiconductors, energy, and quantum technologies to advanced materials. Here is the compilation of

    • Publication date

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    • Used HHVAT System/ Technology

    • Application

    • Publication date

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    • Research Paper Title

    • Authors

    • Authors

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    • Used HHVAT System/ Technology

    • Used HHVAT System/ Technology

    • Application

    • Application

    • Jun 2019

    • Outstanding Room-Temperature Hydrogen Gas Detection by Plasma-Assisted and Graphene-functionalized Core−Shell Assembly of SnO2 Nanoburflower

    • Anupam Nandi, Pratanu Nag, Dipankar Panda, Sukanta Dhar, Syed Minhaz Hossain, Hiranmay Saha, and Sanhita Majumdar

    • DOI: 10.1021/acsomega.9b01372

    • CT150

    • Sensors

    • Publication date

    • Jun 2019

    • Research Paper Title

    • Outstanding Room-Temperature Hydrogen Gas Detection by Plasma-Assisted and Graphene-functionalized Core−Shell Assembly of SnO2 Nanoburflower

    • Authors

    • Anupam Nandi, Pratanu Nag, Dipankar Panda, Sukanta Dhar, Syed Minhaz Hossain, Hiranmay Saha, and Sanhita Majumdar

    • Publication link

    • DOI: 10.1021/acsomega.9b01372

    • Used HHVAT System/ Technology

    • CT150

    • Application

    • Sensors

    • Oct 2018

    • Investigations on a-Si: H thin film solar cells by RF-PECVD

    • T.K. Subramanyam, S. Pavan Kumar, P. Goutham, R. Suresh, K.N. Subramanya

    • DOI: 10.1016/j.matpr.2018.06.500

    • HHV PECVD

    • Photovoltaics

    • Publication date

    • Oct 2018

    • Research Paper Title

    • Investigations on a-Si: H thin film solar cells by RF-PECVD

    • Authors

    • T.K. Subramanyam, S. Pavan Kumar, P. Goutham, R. Suresh, K.N. Subramanya

    • Publication link

    • DOI: 10.1016/j.matpr.2018.06.500

    • Used HHVAT System/ Technology

    • HHV PECVD

    • Application

    • Photovoltaics

    • April 2018

    • Current Controlled Switching in Si/PS/a-Si Heterostructure

    • Sudipta Chakrabarty, Sourav Manda, Ujjwal Ghanta, Jayoti Das, and Syed Minhaz Hossain 

    • DOI : 10.1016/j.matpr.2017.10.168

    • CT150

    • Semiconductor

    • Publication date

    • April 2018

    • Research Paper Title

    • Current Controlled Switching in Si/PS/a-Si Heterostructure

    • Authors

    • Sudipta Chakrabarty, Sourav Manda, Ujjwal Ghanta, Jayoti Das, and Syed Minhaz Hossain 

    • Publication link

    • DOI : 10.1016/j.matpr.2017.10.168

    • Used HHVAT System/ Technology

    • CT150

    • Application

    • Semiconductor

    • January 2018

    • Texturization of ZnO:Al surface by reactive ion etching in SF6/Ar, CHF3/Ar plasma for application in thin film silicon solar cells

    • Gourab Das, Sukanta Bose, Jayasree R. Sharma, Sumita Mukhopadhyay, and Asok K. Barua 

    • DOI : 10.1016/j.matpr.2017.10.168

    • HHV PECVD

    • Photovoltaics

    • Publication date

    • January 2018

    • Research Paper Title

    • Texturization of ZnO:Al surface by reactive ion etching in SF6/Ar, CHF3/Ar plasma for application in thin film silicon solar cells

    • Authors

    • Gourab Das, Sukanta Bose, Jayasree R. Sharma, Sumita Mukhopadhyay, and Asok K. Barua 

    • Publication link

    • DOI : 10.1016/j.matpr.2017.10.168

    • Used HHVAT System/ Technology

    • HHV PECVD

    • Application

    • Photovoltaics

    • April 2017

    • Fabrication and Analysis of Amorphous Silicon TFT

    • Srikanth G, Yadhuraj S R, Subramanyam T K, Satheesh Babu Gandla, and Uma B V

    • DOI : 10.11591/ijece.v7i2.pp754-758

    • HHV PECVD

    • Semiconductor

    • Publication date

    • April 2017

    • Research Paper Title

    • Fabrication and Analysis of Amorphous Silicon TFT

    • Authors

    • Srikanth G, Yadhuraj S R, Subramanyam T K, Satheesh Babu Gandla, and Uma B V

    • Publication link

    • DOI : 10.11591/ijece.v7i2.pp754-758

    • Used HHVAT System/ Technology

    • HHV PECVD

    • Application

    • Semiconductor

    • January 2017

    • Argon plasma treatment of silicon nitride (SiN) for improved antireflection coating on c-Si solar cells

    • Hemanta Ghosh, Suchismita Mitra, Hiranmay Saha, Swapan Kumar Datta, and Chandan Banerjee

    • DOI : 10.1016/j.mseb.2016.11.003

    • HHV PECVD

    • Photovoltaics

    • Publication date

    • January 2017

    • Research Paper Title

    • Argon plasma treatment of silicon nitride (SiN) for improved antireflection coating on c-Si solar cells

    • Authors

    • Hemanta Ghosh, Suchismita Mitra, Hiranmay Saha, Swapan Kumar Datta, and Chandan Banerjee

    • Publication link

    • DOI : 10.1016/j.mseb.2016.11.003

    • Used HHVAT System/ Technology

    • HHV PECVD

    • Application

    • Photovoltaics

    • December 2016

    • Optical and electrical effects of thin reduced graphene oxide layers on textured wafer-based c-Si solar cells for enhanced performance

    • Anupam Nandi, Sanhita Majumdar, Swapan K. Datta, Hiranmay Sahaa and Syed Minhaz Hossain

    • DOI : 10.1039/C6TC04030F

    • CT150

    • Photovoltaics

    • Publication date

    • December 2016

    • Research Paper Title

    • Optical and electrical effects of thin reduced graphene oxide layers on textured wafer-based c-Si solar cells for enhanced performance

    • Authors

    • Anupam Nandi, Sanhita Majumdar, Swapan K. Datta, Hiranmay Sahaa and Syed Minhaz Hossain

    • Publication link

    • DOI : 10.1039/C6TC04030F

    • Used HHVAT System/ Technology

    • CT150

    • Application

    • Photovoltaics

    • December 2016

    • Development of n-type microcrystalline SiOx:H films and its application by innovative way to improve the performance of single junction µc-Si:H solar cell

    • Gourab Das, Sourav Mandal, Sukanta Dhar, Sukanta Bose, Sumita Mukhopadhyay, Chandan Banerjee and A. K. Barua 

    • DOI : 10.1007/s10854-016-6246-y

    • HHV PECVD

    • Photovoltaics

    • Publication date

    • December 2016

    • Research Paper Title

    • Development of n-type microcrystalline SiOx:H films and its application by innovative way to improve the performance of single junction µc-Si:H solar cell

    • Authors

    • Gourab Das, Sourav Mandal, Sukanta Dhar, Sukanta Bose, Sumita Mukhopadhyay, Chandan Banerjee and A. K. Barua 

    • Publication link

    • DOI : 10.1007/s10854-016-6246-y

    • Used HHVAT System/ Technology

    • HHV PECVD

    • Application

    • Photovoltaics

    • September 2016

    • Fabrication and Analysis of Carbon Doped Hydrogenated Amorphous Silicon Thin Film Transistors

    • T. K. Subramanyam, Vinuth Nagendra, Goutham P., Pavan Kumar S., and Subramanya K. N.

    • DOI : 10.5923/j.msse.20160501.03

    • HHV PECVD

    • Semiconductor

    • Publication date

    • September 2016

    • Research Paper Title

    • Fabrication and Analysis of Carbon Doped Hydrogenated Amorphous Silicon Thin Film Transistors

    • Authors

    • T. K. Subramanyam, Vinuth Nagendra, Goutham P., Pavan Kumar S., and Subramanya K. N.

    • Publication link

    • DOI : 10.5923/j.msse.20160501.03

    • Used HHVAT System/ Technology

    • HHV PECVD

    • Application

    • Semiconductor

    • September 2016

    • Optimization of A-SIC: HASBUFFER Layer for efficiency enhancement of amorphous Silicon Solar cells

    • T.K.Subramanyam, Thulasi, Ankita Bengani, Bharath Shivkumar, and R.Suresh

    • DOI : 10.5923/j.msse.20160501.03

    • HHV PECVD

    • Photovoltaics

    • Publication date

    • September 2016

    • Research Paper Title

    • Optimization of A-SIC: HASBUFFER Layer for efficiency enhancement of amorphous Silicon Solar cells

    • Authors

    • T.K.Subramanyam, Thulasi, Ankita Bengani, Bharath Shivkumar, and R.Suresh

    • Publication link

    • DOI : 10.5923/j.msse.20160501.03

    • Used HHVAT System/ Technology

    • HHV PECVD

    • Application

    • Photovoltaics

    • September 2016

    • Optimization of A-SIC: HASBUFFER Layer for efficiency enhancement of amorphous Silicon Solar cells

    • T.K.Subramanyam, Thulasi, Ankita Bengani, Bharath Shivkumar, and R.Suresh


    • HHV PECVD

    • Photovoltaics

    • Publication date

    • September 2016

    • Research Paper Title

    • Optimization of A-SIC: HASBUFFER Layer for efficiency enhancement of amorphous Silicon Solar cells

    • Authors

    • T.K.Subramanyam, Thulasi, Ankita Bengani, Bharath Shivkumar, and R.Suresh

    • Publication link


    • Used HHVAT System/ Technology

    • HHV PECVD

    • Application

    • Photovoltaics

    • February 2016

    • Development of optimized n-μc-Si:H/n-a-Si:H bilayer and its application for improving the performance of single junction a-Si solar cells

    • Sourav Mandal, Sukanta Dhar, Gourab Das, Sumita Mukhopadhyay, and A.K. Barua

    • DOI : 10.1016/j.solener.2015.11.042

    • HHV PECVD

    • Photovoltaics

    • Publication date

    • February 2016

    • Research Paper Title

    • Development of optimized n-μc-Si:H/n-a-Si:H bilayer and its application for improving the performance of single junction a-Si solar cells

    • Authors

    • Sourav Mandal, Sukanta Dhar, Gourab Das, Sumita Mukhopadhyay, and A.K. Barua

    • Publication link

    • DOI : 10.1016/j.solener.2015.11.042

    • Used HHVAT System/ Technology

    • HHV PECVD

    • Application

    • Photovoltaics

    • January 2016

    • Study and Optimization Optical and Electrical properties of the p, i and n- Layers of Single Junction a:Si-H Solar cell in an Indigenously Developed PECVD Cluster System

    • T.K.Subramanyam, Shilpa.G.D., S.S Omprakash, R.Suresh and B.S.Satyanarayana


    • HHV PECVD

    • Photovoltaics

    • Publication date

    • January 2016

    • Research Paper Title

    • Study and Optimization Optical and Electrical properties of the p, i and n- Layers of Single Junction a:Si-H Solar cell in an Indigenously Developed PECVD Cluster System

    • Authors

    • T.K.Subramanyam, Shilpa.G.D., S.S Omprakash, R.Suresh and B.S.Satyanarayana

    • Publication link


    • Used HHVAT System/ Technology

    • HHV PECVD

    • Application

    • Photovoltaics

    • May 2015

    • Development of a novel fluorinated n-nc-SiO:H material for solar cell application

    • Sourav Mandal, Gourab Das, Sukanta Dhar, Rajive M. Tomy, Sumita Mukhopadhyay, Chandan Banerjee, and A.K. Barua

    • DOI : 10.1016/j.matchemphys.2015.03.027

    • HHV PECVD

    • Photovoltaics

    • Publication date

    • May 2015

    • Research Paper Title

    • Development of a novel fluorinated n-nc-SiO:H material for solar cell application

    • Authors

    • Sourav Mandal, Gourab Das, Sukanta Dhar, Rajive M. Tomy, Sumita Mukhopadhyay, Chandan Banerjee, and A.K. Barua

    • Publication link

    • DOI : 10.1016/j.matchemphys.2015.03.027

    • Used HHVAT System/ Technology

    • HHV PECVD

    • Application

    • Photovoltaics